发明名称 THIN POLISHING PAD WITH WINDOW AND MOLDING PROCESS
摘要 A polishing pad is described that has a polishing layer with a polishing surface, an adhesive layer on a side of the polishing layer opposite the polishing layer, and a solid light-transmitting window extending through and molded to the polishing layer. The window has a top surface coplanar with the polishing surface and a bottom surface coplanar with a lower surface of the adhesive layer. A method of making a polishing pad includes forming an aperture through a polishing layer and an adhesive layer, securing a backing piece to the adhesive layer on a side opposite a polishing surface of the polishing layer, dispensing a liquid polymer into the aperture, and curing the liquid polymer to form a window.
申请公布号 WO2008154185(A3) 申请公布日期 2009.02.12
申请号 WO2008US65316 申请日期 2008.05.30
申请人 APPLIED MATERIALS, INC.;BENVEGNU, DOMINIC J.;ZHANG, JIMIN;OSTERHELD, THOMAS H.;SWEDEK, BOGUSLAW A. 发明人 BENVEGNU, DOMINIC J.;ZHANG, JIMIN;OSTERHELD, THOMAS H.;SWEDEK, BOGUSLAW A.
分类号 B24B37/04 主分类号 B24B37/04
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