发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.
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申请公布号 |
US7489388(B2) |
申请公布日期 |
2009.02.10 |
申请号 |
US20030740832 |
申请日期 |
2003.12.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOX WILHELMUS JOSEPHUS;EGGINK HENDRIK JAN |
分类号 |
G03B27/58;G03B27/62;G03F7/20;H01L21/027;H01L21/683 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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