FABRICATION METHOD OF MULTI-LAYER GATE DIELECTRIC ON ORGANIC SUBSTRATE USING SPIN COATING AND ATOMIC LAYER DEPOSITION, AND METHOD OF FABRICATING ORGANIC SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20070017165-传众专利搜索

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发明名称	FABRICATION METHOD OF MULTI-LAYER GATE DIELECTRIC ON ORGANIC SUBSTRATE USING SPIN COATING AND ATOMIC LAYER DEPOSITION, AND METHOD OF FABRICATING ORGANIC SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR100882722(B1)	申请公布日期	2009.02.06
申请号	KR20070017165	申请日期	2007.02.20
申请人		发明人
分类号	H01L21/336;H01L21/205	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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