发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, SPACER FOR LIQUID CRYSTAL DISPLAY, AND LIQUID CRYSTAL DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a solution of a radiation-sensitive resin composition for spacer formation giving a uniform and even film thickness and suitable for a slit die coater method. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) another unsaturated compound different from the component (a1), (B) a polymerizable unsaturated compound, (C) a radiation-sensitive radical generator, and (D) a solvent represented by formula (1), wherein R<SB>1</SB>is a 1-3C alkyl group, and R<SB>2</SB>is a hydrogen atom or a 1-3C alkyl group. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009025369(A) 申请公布日期 2009.02.05
申请号 JP20070185663 申请日期 2007.07.17
申请人 JSR CORP 发明人 MATSUDA KENTARO;HAMAGUCHI HITOSHI
分类号 G03F7/004;G02F1/1339;G03F7/038 主分类号 G03F7/004
代理机构 代理人
主权项
地址
您可能感兴趣的专利