发明名称 SEMICONDUCTOR APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor apparatus which suppresses a longitudinal leak current. SOLUTION: The semiconductor apparatus includes a substrate, a first conductivity type GaN layer provided on the substrate, a barrier layer provided on the GaN layer and formed of In<SB>X</SB>Al<SB>Y</SB>Ga<SB>1-X-Y</SB>N (4.66X≤Y≤4.66X+0.41, X+Y≤1), a channel layer provided on the barrier layer and formed of GaN, an electron supply layer provided on the channel layer and formed of a nitride semiconductor having a larger band gap than the channel layer, a source electrode provided in contact with a surface of the electron supply layer, a drain electrode provided in contact with the surface of the electron supply layer, and a gate electrode provided between the source electrode and drain electrode on the electron supply layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009026975(A) 申请公布日期 2009.02.05
申请号 JP20070189028 申请日期 2007.07.20
申请人 TOSHIBA CORP 发明人 NODA TAKAO;SAITO YASUNOBU;SAITO WATARU;FUJIMOTO HIDETOSHI;YOSHIOKA HIROSHI;NITTA TOMOHIRO;KAKIUCHI YORITO
分类号 H01L21/338;H01L29/41;H01L29/778;H01L29/812 主分类号 H01L21/338
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