| 摘要 |
PROBLEM TO BE SOLVED: To provide a xenon difluoride (XeF<SB>2</SB>) supply apparatus capable of efficiently and surely supplying xenon difluoride (XeF<SB>2</SB>). SOLUTION: The XeF<SB>2</SB>supply apparatus is provided with a heating means for heating a container containing a solid XeF<SB>2</SB>therein, a piping heating means, a means for detecting the inner pressure of the piping, a first memorizing means having memorized the relation between the vapor pressure and temperature of solid XeF<SB>2</SB>, a second memorizing means having memorized the relation between the heating temperature of the container heating means and the heating temperature of the piping heating means, and a control means for controlling respective heating means; and finds a set pressure by adding a prescribed pressure to an initial set pressure input, finding a temperature as container heating temperature target value to provide the set pressure from the relation between vapor pressure and temperature by the first memorizing means, finding a piping heating temperature target value from the relation between both temperatures memorized by the second memorizing means, and controls the container heating means based on the container heating temperature target value and the piping heating means based on the piping heating temperature target value, also controls the container heating temperature target value to be in such a direction that the measuring pressure coincides with the set pressure. COPYRIGHT: (C)2009,JPO&INPIT
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