TFT PANEL SUBSTRATE INSPECTING DEVICE

摘要

A TFT panel substrate inspecting device includes an electron beam generating source for performing irradiation with an electron beam, a second electron detector for detecting a second electron generated from a pixel by the irradiation with the electron beam, and a voltage application unit composed of a plurality of probe pins for applying a reference voltage to an electrode on a plurality of TFT panel substrates by coming into contact with the electrode. The voltage application unit includes a prober frame surrounding the outer periphery of the TFT panel substrate. The prober frame includes at least one inner frame surrounding the TFT panel substrate and a rim-like outer frame surrounding the inner frame inwardly. The flexure of the inner frame generated by the weight of the inner frame and the reactive force of the probe pin is reduced and the surface rigidity is increased by attaching the inner frame to the inner periphery wall of the outer frame, applying a pulling load thereto. Consequently, contact pressure between each probe pin and the electrode of the TFT panel substrate is uniformized.