发明名称 TREATMENT DEVICE AND GAS SUPPLY UNIT
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method capable of removing impurity metal, particularly copper from the surface of a quartz-made composition member without causing a large increase in equipment cost by using an oxidizing gas and a reducing gas. SOLUTION: In the method for cleaning this treatment device designed to perform predetermined treatment on a treated object where at least one out of each composition member is formed of quarts, the treatment device includes a treatment container 4 arranged so that evacuation is possible, a support means 6 that supports the treated object in the treatment container, a heating means 24 that heats the treated object, a gas supply means 28 that supplies a predetermined gas to the treatment container wherein the oxidizing gas and the reducing gas are supplied to the treatment container to clean the quartz-made composition member by making both the gases react with each other. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009027182(A) 申请公布日期 2009.02.05
申请号 JP20080232404 申请日期 2008.09.10
申请人 TOKYO ELECTRON LTD 发明人 TOMITA MASAHIKO;UMEZAWA KOUTAI;SON AKIRA;NISHIMURA TOSHIHARU
分类号 H01L21/31;C23C16/44 主分类号 H01L21/31
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