发明名称 SUBSTRATE TEMPERATURE MEASURING APPARATUS AND SUBSTRATE TEMPERATURE MEASUREMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate temperature measuring apparatus and a substrate temperature measurement method for highly accurately measuring a substrate temperature. SOLUTION: The substrate temperature measuring apparatus includes: a heating source 10 for heating a substrate 100; a transmission window 30 for transmitting infrared light in a wavelength region which cannot be transmitted through the substrate 100; and a thermometer 40 that includes in its sensitivity range, the wavelength region which can not be transmitted through the substrate 100, and that measures the substrate temperature of the substrate 100 by analyzing infrared light radiated from the substrate 100 heated by the heating source 10 and transmitted through the transmission window 30. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009027100(A) 申请公布日期 2009.02.05
申请号 JP20070191358 申请日期 2007.07.23
申请人 ROHM CO LTD;TOHOKU UNIV 发明人 NAKAHARA TAKESHI;KAWASAKI MASASHI;OTOMO AKIRA;TSUKASAKI ATSUSHI
分类号 H01L21/363;C23C14/54;G01J5/00 主分类号 H01L21/363
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