发明名称 CONDITIONING DISC FOR POLISHING PAD
摘要 A conditioning disk for grinding pad is provided to actively make polishing working as a cutting protrusion is a polygonal cone shape and prevent scratch generated by dropped particle from a cutting protrusion and a foreign material existing on a grinding pad. A conditioning disk for grinding pad comprises a conditioning disk(100) for a grinding pad, a disk body(110), a plurality of foreign substance discharge grooves(130) formed in one of the disk body with the radial shape and a plurality of cutting protrusions(120) protruding to one side of the disk body. The conditioning disk for grinding pad is formed by sintering nano powder of ceramics, diamond and boron nitriding compound.
申请公布号 KR20090013366(A) 申请公布日期 2009.02.05
申请号 KR20070077425 申请日期 2007.08.01
申请人 CERACOREE CO., LTD. 发明人 YOUN, KYUNG SOO
分类号 B24D7/02;B24D3/00 主分类号 B24D7/02
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