SUBSTRATE TREATING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating apparatus capable of surely keeping non-contact state between a non-rotary ring and a rotary ring in a configuration using a non-contact type seal. SOLUTION: A non-contact type seal mechanism 29 is provided with a rotary ring 34 fixed to a spin base 10 and a non-rotary ring 32 supported by a base part 30 to be movable in the vertical direction and arranged to face the rotary ring 34. The non-rotary ring 32 is pressed upward by the pressing force of a plurality of springs 31 supported by the base part 30. The rotary ring 32 and the non-rotary 34 are made from a permanent magnet to repel each other. The non-rotary ring 32 is severalμm to several tenμm apart from the rotary ring 34 by the repelling force of the permanent magnet against the pressing force and then, the non-rotary ring 32 and the rotary ring 34 are in non-contact state with each other. COPYRIGHT: (C)2009,JPO&INPIT