| 摘要 |
A substrate processing apparatus includes a chamber having a process space, a support plate in the chamber to support a substrate, a shower head above the support plate and having a body with an opened lower part, and a spray plate connected to the lower part of the body to supply source gas above the support plate. The apparatus further includes a sensing unit having a sensor and an elastic member. One end of the sensor is in contact with an upper surface of the spray plate. The elastic member provides elastic force to the sensor in a direction toward the spray plate. |
