发明名称 |
Charged Particle Beam Irradiation System |
摘要 |
It is to prevent an image drift from occurring caused by a specimen being charged when observing the specimen including an insulating material. A first scan is performed in a predetermined direction on scanning line and in a predetermined sequential direction of scanning lines and a second scan is performed in a scanning direction different from the predetermined scanning direction and in a sequential direction different from the predetermined sequential direction. An image may be created by repeating the process of executing the second scan after executing the first scan and by requiring the arithmetic average of the frames obtained by the second scans. An image may be created by averaging arithmetically at least one frame obtained by the first scan and at least one frame obtained by the second scan.
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申请公布号 |
US2009032723(A1) |
申请公布日期 |
2009.02.05 |
申请号 |
US20080182709 |
申请日期 |
2008.07.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
FUKAYA RITSUO;WANG ZHIGANG |
分类号 |
H01J3/14 |
主分类号 |
H01J3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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