METHOD FOR ADJUSTING EXPOSURE APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A method is provided for adjusting an immersion exposure apparatus (EX), which has a holder (2H) for holding a substrate (P), and a holder (8H) for holding the substrate (P) prior to holding the substrate (P) by the holder (2H), and exposes the substrate (P) held by the holder (2H) through a liquid (LQ). The adjusting method includes a step of holding a thermometer (30) by the holder (2H); a step of holding the thermometer (30) by the holder (8H); and a step of adjusting at least the temperature of the holder (2H) or that of the holder (8H), based on the detection results obtained from the thermometer (30) held by the holder (2H) and the detection results obtained from the thermometer (30) held by the holder (8H).