发明名称 SUBSTRATE ABNORMALITY GENERATION SOURCE IDENTIFYING SYSTEM, PROGRAM THEREOF, AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a system, a program therefor, and a method thereof, which can reliably identify a manufacturing device as a defect generation cause, without having to depend on information about what kind of defects a group of such manufacturing devices forming a manufacturing line, or the like, have generated. SOLUTION: With respect to each of a plurality of manufacturing devices, a source identifying system of substrate abnormality generation comprises a contact region data recording unit for recording a title of the manufacturing device to be associated with a first region of the manufacturing device contacted with a semiconductor substrate, by having an appearance inspection result input unit for inputting a second region that has an abnormality therein detected by carrying out appearance inspection of the semiconductor substrate, a substrate abnormality generation source retrieval unit identifies the first region, containing the second region inputted from the appearance inspection result input unit, and extracts the title of the manufacturing device for the identified first region. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009026839(A) 申请公布日期 2009.02.05
申请号 JP20070186507 申请日期 2007.07.18
申请人 FUJITSU MICROELECTRONICS LTD 发明人 SHIGETA NOBUO
分类号 H01L21/66;H01L21/02 主分类号 H01L21/66
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