发明名称 APPARATUS AND METHOD FOR WET-CHEMICAL PROCESSING OF FLAT, THIN SUBSTRATES IN A CONTINUOUS METHOD
摘要 The invention relates to a method and apparatus for wet-chemical processes (cleaning, etching, stripping, coating, dehydration) in a continuous method for flat, thin and fracture-sensitive substrates, the substrate transport and the wet process being effected by media-absorbing rollers.
申请公布号 US2009032492(A1) 申请公布日期 2009.02.05
申请号 US20080126870 申请日期 2008.05.24
申请人 ACP - ADVANCED CLEAN PRODUCTION GMBH 发明人 KUNZE-CONCEWITZ HORST
分类号 B44C1/22;B05C1/00;B05D5/12;C23F1/08 主分类号 B44C1/22
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