| 摘要 |
A pattern formation method includes discharging a functional liquid substance having a functional material to an object, and irradiating the functional liquid substance with light emitted from a light source thereby to form a pattern of a functional film on the object. In this method, when the thickness of the functional liquid substance on an optical axis of the light is L and the absorption coefficient of the functional liquid substance for the light is alpha, the thickness and the absorption coefficient are set so as to satisfy an equation (1): <?in-line-formulae description="In-line Formulae" end="lead"?>0.1<=alpha.L<=0.6 (1)<?in-line-formulae description="In-line Formulae" end="tail"?>
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