| 摘要 |
The invention relates to a device for determining and/or monitoring at least one process parameter, having at least one substrate (1) made of a substrate material, having at least one sensitive layer (2) applied to the substrate (1) and generating at least one measurement variable as a function of the process parameter and/or a change in the process parameter, and having at least one passivation layer (3) applied to the sensitive layer. According to the invention, the passivation layer (3) is made at least partially of the substrate material. |
