SUBSTRATE SUPPORT MECHANISM, REDUCED-PRESSURE DRYING UNIT AND SUBSTRATE PROCESSING APPARATUS

摘要

A substrate support mechanism is provided to maintain constant temperature of the substrate to be processed while reducing interference form temperature around a support pin. A substrate support mechanism mounts the substrate to be processed and support it by the end of the support pin. The electricity support pin(128) is comprised of the whole of a hollow and the end of it is blocked. A ventilation opening(128c) is installed in the side wall of the electricity support pin. The inner temperature of the partition member is controlled by flowing a predetermined gas through a ventilation opening. For this, the gas supply part or the vacuum source is connected to the base end of the partition member.