发明名称 INSPECTION APPARATUS AND SUBSTRATE TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To improve a flatness of a substrate (particularly, the flatness of a part to be photographed) when the substrate is photographed, and to photograph the upper surface of the substrate exactly. SOLUTION: In an inspection apparatus 1, a first conveying part 5 and a second conveying part 6 which are a roller conveying mechanism conveying the substrate 90 at a horizontal attitude are provided. Further, a supporting part 2 is provided between the first conveying part 5 and the second conveying part 6 to floatation-support the substrate 90 during the conveyance, and at the same time, the substrate 90 at the floatation-supported state by the supporting part 2 is photographed by a line camera 31 photographing a line of an x-axis direction. The supporting part 2 floatation-supports the substrate 90 by air discharged from a floating stage at a state apart from the substrate 90. In such a manner, in a position E (photographing position) of a y-axis direction, a member of the inspection apparatus 1 does not abut to the substrate 90 over the whole width of the x-axis direction. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009022823(A) 申请公布日期 2009.02.05
申请号 JP20070185593 申请日期 2007.07.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TANAKA IWAO;YAMAMOTO SATOSHI;ODA YASUSHI
分类号 B05C11/00;B05C13/02;G01N21/956 主分类号 B05C11/00
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