发明名称 Semiconductor Pressure Sensor and Fabrication Method Thereof
摘要 A semiconductor pressure sensor is provided that includes a diaphragm, a resistive element arranged at an upper portion of the diaphragm, an insulating film arranged on an upper face of the resistive element and an upper face of the diaphragm, a via that penetrates through a portion of the insulating film and comes into contact with the resistive element, and wiring that is electrically connected to the resistive element through the via. The insulating film includes a concave portion having a bottom face that is substantially flat. The wiring is arranged on the bottom face of the concave portion, and the depth of the concave portion is substantially equal to the thickness of the wiring.
申请公布号 US2009031817(A1) 申请公布日期 2009.02.05
申请号 US20080176464 申请日期 2008.07.21
申请人 MITSUMI ELECTRIC CO., LTD. 发明人 FUJIOKA YASUHIDE
分类号 H01L21/00;G01L9/02 主分类号 H01L21/00
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