发明名称 METHOD AND APPARATUS FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing the silicon carbide single crystal preventing a silicon carbide single crystal from cracking while keeping a growth space region in a uniformly heated state, in the growth of the silicon carbide single crystal. SOLUTION: The apparatus for producing the silicon carbide single crystal comprises a partitioning plate 23c in an opening end of a cylindrical part 23b in a closing part 23 composing a lid 20, so as to prevent sublimated gas from flowing into the space 23e between the inner wall of the side wall part 21 composing the lid 20 using the partitioning plate 23c and the cylindrical part 23b. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009023879(A) 申请公布日期 2009.02.05
申请号 JP20070189329 申请日期 2007.07.20
申请人 DENSO CORP 发明人 YAMADA MASANORI;URAGAMI YASUSHI
分类号 C30B29/36 主分类号 C30B29/36
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