| 摘要 |
PROBLEM TO BE SOLVED: To provide an acrylic amide-based compound having a new cyclic structure useful as a monomer, etc., for photoresist used for production of semiconductor, and a method for producing the compound. SOLUTION: The present invention provides a (meth)acrylic amide-based compound having a cyclic structure represented by general formula (1) (wherein R is a hydrogen atom or a methyl group; n and m are each independently 1 or 2) and its polymer and provides a method for producing the (meth)acrylic amide-based compound which comprises reacting (meth)acrylamide with 2,3-dihydrofuran and/or 3,4-dihydropyran in the presence of an acid catalyst. COPYRIGHT: (C)2009,JPO&INPIT
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