| 摘要 |
A coating removal composition comprising: A) at least 50% wt of the total composition comprising one or more of non-ionic surfactants and/or anionic surfactants; B) an inorganic base; C) an optional component of one or more multi-functional alcohols, different from A); D) an optional component of one or more tertiary amines; and optionally, E) chelating agents, viscosity modifiers, surfactants different from A)-D), and mixtures thereof; the composition comprising less than 20 wt % water. The coating removal compositions are useful in stripping coatings from substrate surfaces and may be formulated to be essentially free (or, desirably, entirely free) of water and organic solvents classified as volatile organic compounds or HAPS.
|
