| 摘要 |
A reactor for an atomic layer deposition (ALD) method, the reactor comprising a vacuum chamber which has a first end wall provided with a loading hatch, a second end wall provided with a rear flange, side walls/casing connecting the first and the second end walls, and at least one source material fitting for feeding source materials into the vacuum chamber of the reactors. According to the invention, at least one of the source material fittings is provided in the side wall/casing of the vacuum of the reactor.
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