发明名称 HIGH HARDNESS Ag ALLOY SPUTTERING TARGET FOR FORMING REFLECTIVE FILM OF OPTICAL RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide an Ag alloy sputtering target for forming an Ag alloy reflective film of an optical recording medium (a CD-RW, a DVD-RAM or the like). SOLUTION: The Ag alloy sputtering target has a component composition comprising, by mass, 0.1-3.0% Cu, 0.05-2.0% Ga, 0.001-0.1% Ca and the balance being Ag and inevitable impurities. The target has a flange 2 at the periphery of a target main body 1 and a Vickers hardness within a range of 40-70. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009024212(A) 申请公布日期 2009.02.05
申请号 JP20070187778 申请日期 2007.07.19
申请人 MITSUBISHI MATERIALS CORP 发明人 KOMIYAMA SHOZO;MISHIMA TERUSHI
分类号 C23C14/34;C22C5/06;C22F1/00;C22F1/14;G11B7/26 主分类号 C23C14/34
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