发明名称 VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD, AND ELECTRONIC ELEMENT AND ORGANIC ELECTROLUMINESCENT ELEMENT HAVING PATTERN-FORMED LAYER USING THE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method for highly accurately performing patterning when performing pattern-forming by using a flexible substrate, and to provided an electronic element and an organic electroluminescent element each having a pattern-formed layer using the method. SOLUTION: The vapor deposition apparatus 10 has a vacuum tank 12, a container 30 for storing and evaporating a material for vapor deposition, substrate holding means 16 and 18, a mask holding means 28, position measurement means 32a and 32b for measuring the positions of respective alignment marks 38 and 44 of a flexible substrate 36 held by the substrate holding means and a mask 40 held by the mask holding means, and a position control means 34 for performing the positioning of the flexible substrate with respect to the mask by extending the flexible substrate by the substrate holding means based on the measurement by the position measurement means. After the flexible substrate is extended in the predetermined direction by the predetermined amount and positioned to the mask, the material for vapor deposition is vapor-deposited to the predetermined pattern via the mask. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009024208(A) 申请公布日期 2009.02.05
申请号 JP20070187454 申请日期 2007.07.18
申请人 FUJIFILM CORP 发明人 TADA HIROSHI
分类号 C23C14/54;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/54
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