METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE

摘要

Provided is a method for manufacturing a photovoltaic device, by which a texture having an aspect ratio larger than 0.5 can be easily formed. The method includes a step of forming an etching resistant film on a silicon substrate; a step of exposing the basic silicon substrate surface by making a plurality of fine holes on the etching resistant film by irradiating the film with a laser beam whose focal depth is adjusted to 10µm or more; and a step of etching the surface of the silicon substrate. In the step of exposing the silicon substrate surface, a fine recess is formed at a concentric position to the fine hole on the silicon substrate under the etching resistant film.