发明名称 METHODS OF FORMING A FERROELECTRIC LAYER AND METHODS OF MANUFACTURING A FERROELECTRIC CAPACITOR INCLUDING THE SAME
摘要 A method of forming a ferroelectric layer is provided. A metal-organic source gas is provided into a chamber into which an oxidation gas is provided for a first time period to form ferroelectric grains on a substrate. A ferroelectric layer is formed by performing at least twice a step of providing a metal-organic source gas into the chamber during the first time period using a pulse method to grow the ferroelectric grains.
申请公布号 US2009035877(A1) 申请公布日期 2009.02.05
申请号 US20080183657 申请日期 2008.07.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 IM DONG-HYUN;KIM IK-SOO;LEE CHOONG-MAN;HEO JANG-EUN;LEE SUNG-JU
分类号 H01L21/02;C23C16/00 主分类号 H01L21/02
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