| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist underlayer film forming composition excellent in embedding property, generating a small amount of sublimate, and capable of forming a resist underlayer film excellent in antireflection function and etching resistance. <P>SOLUTION: The resist underlayer film forming composition comprises a polymer having repeating units represented by general formulae (1)-(3) and a solvent. <P>COPYRIGHT: (C)2009,JPO&INPIT |
