| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve high quality exposure by facilitating liquid control while facilitating the eccentricity measurement of a final lens in an immersion exposure apparatus in which an exposure region on a second object side of the final lens does not include the optical axis of a projection optical system. <P>SOLUTION: The exposure apparatus is provided with the projection optical system for projecting the image of the pattern of a first object onto a second object and exposes the second object through liquid between a lens (final lens) arranged most on the second object side of the projection optical system and the second object, wherein the projection optical system is configured in such a manner that the surface on the first object side of the lens has refractive power, the exposure region (projection region) on the surface on the second object side of the lens does not include the optical axis of the projection optical system, and the surface on the second object side of the lens includes the optical axis and is smaller than an effective region on the surface on the first object side of the lens. <P>COPYRIGHT: (C)2009,JPO&INPIT |
