发明名称 COATING AND DEVELOPING DEVICE, OPERATING METHOD OF COATING AND DEVELOPING DEVICE, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To shorten a time for which a substrate unnecessarily stays at an inspection module as to a coating and developing device including a conveyance path for subjecting the substrate to coating and developing treatments and a conveyance path only for inspecting the substrate in parallel. SOLUTION: A control means for controlling a handover means for a carrier block and a substrate conveying means for an inspection block conveys the substrate to a third or fourth stage at a treatment block by the substrate conveying means through or not through the inspection module, and a substrate only for inspection is passed by the handover means from a carrier carried in the carrier block to a second stage, and the substrate is passed by the substrate carrying means to the inspection module, and the substrate is carried to the third stage or fourth stage after inspection is completed. The substrate from the treatment block and the substrate from the carrier are taken in the inspection module in parallel not to limit handover destinations of substrates after inspection to one. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009026916(A) 申请公布日期 2009.02.05
申请号 JP20070187874 申请日期 2007.07.19
申请人 TOKYO ELECTRON LTD 发明人 KANEKO TOMOHIRO;MIYATA AKIRA
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
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