发明名称 SUBSTRATE AND MANUFACTURING METHOD OF THE SAME, AND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 A substrate for fixing an integrated circuit element includes: a plurality of metal columns that are aligned in a longitudinal direction and a lateral direction in a planar view, each of the plurality of metal columns having a first face and a second face facing opposite direction to the first face; and a connecting part that connects the plurality of metal columns one another at a part of each of the plurality of metal columns between the first face and the second face. In the substrate, a recognition mark is formed on the first face of one of the plurality of metal columns.
申请公布号 US2009034225(A1) 申请公布日期 2009.02.05
申请号 US20080168518 申请日期 2008.07.07
申请人 SEIKO EPSON CORPORATION 发明人 SHOJI MASANOBU;FUJITA TORU
分类号 H01L21/50;H05K7/02 主分类号 H01L21/50
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