发明名称 Characterization of Three-Dimensional Distribution of Defects by X-Ray Topography
摘要 Provided is a method of determining a three-dimensional distribution of structural defects in a single crystal material, the method comprising: (a) disposing a single crystal sample on a holder, the sample being set to a symmetric reflection in the Bragg Geometry; (b) projecting a beam of incident x-rays on a predetermined crystal plane in the sample and reflecting the x-rays while the sample is azimuthally rotating with respect to an normal axis, the normal axis being perpendicular to the predetermined crystal plane; (c) obtaining geometrical measured values of a two-dimensional configuration of defects on the detector plane of a CCD detector; and (d) determining the three-dimensional distribution of the defects in the sample by formulating a geometrical relation between a three-dimensional configuration of defects on the sample and the geometrical measured values of the two-dimensional configuration of defects on the detector plane.
申请公布号 US2009034681(A1) 申请公布日期 2009.02.05
申请号 US20060087402 申请日期 2006.01.06
申请人 POSTECH FOUNDATION;POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 JE JUNG HO;YI JAE MOK
分类号 G01N23/207 主分类号 G01N23/207
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