| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a phase shift mask having small critical dimension (CD) error sensitivity to variations in a polarization state. <P>SOLUTION: The phase shift mask comprises a transmissive substrate SUB including two kinds of transmissive regions 101, 102 alternately disposed and a light shielding film (absorber) m disposed as interposed between the two kinds of transmissive regions 101, 102 on the surface of the transmissive substrate SUB. The two kinds of transmissive regions include a first transmissive region 101 having an engraved part (trench) T for phase shift and a second transmissive region 102 having no trench. The surface of the transmissive substrate SUB is exposed in a region 110 between a side wall of the trench and a side wall of the light shielding film m adjacent to the trench, which constitutes a two-level step feature. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
