| 摘要 |
A semiconductor manufacturing apparatus having a trap for a vacuum line is provided to discharge the exhaust gas through the vacuum line between the dry pump and the processing chamber. A manufacturing apparatus for a semiconductor in which the powder prevention trap is mounted comprises a processing chamber, a vacuum line(1), a dry pump, a throttle valve(3) and a trap(2). The processing chamber performs the manufacturing process by receiving the process gas from the shower head. The vacuum line discharges the non-reacted gas between the substrate and the process gas from the processing chamber. The dry pump performs the air pumping function to the processing chamber. The throttle valve controls the pressure of the gas flowed into the vacuum line from the processing chamber.
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