EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE

摘要

An exposure apparatus, and an exposure method using the exposure apparatus are provided to improve the precision of the location determination of a substrate in case of exposure by using a laser measurement system. An exposure apparatus comprises a plurality of chucks(10a, 10b) holding a substrate; a mask holder(20) holding a photomask(2); a main stage base(11) arranged at the lower part of the mask holder; a plurality of sub-stage bases(11a, 11b) arranged closely at the X (or Y) direction of the main stage base; a guide(13) extending to the plurality of sub-stage bases on the main stage base; a plurality of moving stages which has a first stage loaded on the guide to move in the X (or Y) direction a second stage loaded on the first stage to move in Y (or X) direction and a third stage loaded on the second stage to rotate in the theta direction, and moves to the upper part of the one sub-stage base and the upper part of the main stage base to determine the location of the substrate at the upper part of the sub-stage base; a plurality of first laser measurement systems which determines the location of the X (or Y) direction of the each moving stage; a plurality of stage drive circuits(80a, 80b) which drives the moving stage; and a control device(70) which controls the drive circuits.