| 摘要 |
<p>A system exposing apparatus and device manufacturing method are provided to obtain the high precision by controlling the astigmatic difference. The neighborhood of the object plane includes at least one first bending optical member(1). Moreover, the neighborhood of the upper side includes at least one second bending optical member(2). In case the imaging magnification of the upper side about the object plane as beta, the optical system ofbeta = 1 has adjusting means(8a,8b) executing the astigmatic difference of the optical system and control of distortion. The adjusting mean moves the first and the second bending optical member to the direction in which the change of the astigmatic difference does not correspond. The absolute value of the amount of the astigmatic difference moves in order to be approximately identical and then the astigmatic difference can not be changed and distortion can be controlled.</p> |
