| 摘要 |
<p>A developing device, a developing method, and a storage medium are provided to suppress instability of the developer supply to a substrate by using a classified developer nozzle. A resist is coated on a substrate. After exposing a substrate holding support unit, the substrate holding support unit holds and supports the substrate horizontally and rotates the substrate around a plumb axis. A plurality of development process parts(21a,21b,21c) are arranged to a traverse direction. A first developer nozzle is installed in a plurality of development process parts commonly. The first developer nozzle supplies the developer to the surface of the substrate supported and held in the substrate holding support unit with a band shape. A driving unit(24) transfers the first developer nozzle to each development processing parts. The driving unit moves the first developer nozzle from the center and the peripheral part on the surface of the substrate to the other side for forming a liquid layer of the developer on the surface of the substrate. A second developer nozzle prevents the dryness of the liquid layer of the developer by supplying the developer to the center of the substrate with the liquid layer of the developer by the first developer nozzle with a short band shape.</p> |
