MOLD FILM COMPOSITION FOR FORMING PATTERN AND MOLD FILM COMPOSITION MANUFACTURED BY USING THE SAME

摘要

A mold film composition for forming a pattern, and a mold film prepared by using the composition are provided to improve heat resistance and the enhance the uniformity of pattern formed on a substrate even in case of the exposure of UV rays. A mold film composition for forming a pattern comprises 30-70 wt% of at least two kinds of reactive oligomers selected from a polyester-based reactive oligomer, a silicone-based reactive oligomer, an acrylic reactive oligomer, and an epoxy acrylate-based reactive oligomer; 30-70 wt% of a monofunctional or multifunctional monomer having at least one unsaturated group in a molecule; and 1-10 parts by weight of a photoinitiator.