发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
<p>This invention provides an exposure apparatus which exposes a substrate (51) with a pattern formed on a reticle (3), and includes a projection optical system (1) including an optical element (11 - 14) and a reflecting surface (42) which reflects light toward the projection optical system (1). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (11 - 14) based on first light which is incident on the projection optical system (1) and reflected by the reflecting surface (42) and a surface of the optical element (11 - 14) and second light which is incident on the projection optical system (1) and not reflected by the reflecting surface (42) and the surface of the optical element (11 - 14).</p> |
申请公布号 |
EP2020619(A1) |
申请公布日期 |
2009.02.04 |
申请号 |
EP20080159489 |
申请日期 |
2008.07.02 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KAWASHIMA, HARUNA;SAITO, NOBUYUKI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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