发明名称 Nonvolatile semiconductor storage device and its manufacturing method
摘要 There is provided a nonvolatile semiconductor storage device less subject to variances of electric characteristics among memory cells. A floating gate electrode provided on a substrate is made of two or more materials different in carrier trapping efficiency so as to accumulate carriers and thereby store data in the floating gate electrode. Thus a region without so large changes of the threshold voltage is produced, and the portion with a small change is used as the margin for circuit operations, thereby to eliminate variances among cells and realize high-speed operations.
申请公布号 US7485527(B2) 申请公布日期 2009.02.03
申请号 US20060456024 申请日期 2006.07.06
申请人 SONY CORPORATION 发明人 KAWASHIMA NORIYUKI;TAIRA KENICHI
分类号 H01L21/336;H01L21/8247;G11C11/56;G11C16/04;H01L21/28;H01L21/3205;H01L21/4763;H01L27/115;H01L29/423;H01L29/49;H01L29/51;H01L29/788;H01L29/792 主分类号 H01L21/336
代理机构 代理人
主权项
地址