发明名称 SOI contact structures
摘要 Disclosed are an arrangement and a production method for electrically connecting active semiconductor structures in or on a monocrystalline silicon layer (12) located on the front face (V) of silicon-on-insulator semiconductor wafers (SOI, 10) to the substrate (13). The electrical connection (20) is made through an insulator layer (11). A stack of layers (30 to 32, 70 to 72) is disposed above the connection piece (20) on the insulator layer (11).
申请公布号 US7485926(B2) 申请公布日期 2009.02.03
申请号 US20050543896 申请日期 2005.07.29
申请人 X-FAB SEMICONDUCTOR FOUNDRIES AG 发明人 RICHTER STEFFEN;NUERNBERGK DIRK;GOETTLICH WOLFGANG
分类号 H01L21/00;H01L21/74 主分类号 H01L21/00
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