发明名称 |
Inspection method for semiconductor wafer and apparatus for reviewing defects |
摘要 |
An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
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申请公布号 |
US7485858(B1) |
申请公布日期 |
2009.02.03 |
申请号 |
US20060607906 |
申请日期 |
2006.12.04 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OBARA KENJI;HIRAI TAKEHIRO |
分类号 |
G01N23/00;A61N5/00;G21G5/00;G21K5/10;G21K7/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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