发明名称 Inspection method for semiconductor wafer and apparatus for reviewing defects
摘要 An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
申请公布号 US7485858(B1) 申请公布日期 2009.02.03
申请号 US20060607906 申请日期 2006.12.04
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OBARA KENJI;HIRAI TAKEHIRO
分类号 G01N23/00;A61N5/00;G21G5/00;G21K5/10;G21K7/00 主分类号 G01N23/00
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