发明名称 |
ECR plasma source and ECR plasma device |
摘要 |
An ECR plasma source of the invention is constructed of: a plasma generating chamber (10) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils (20, 21) wound in generally rectangular shapes in a plane normal to the plasma flow; and a direct introduction type or branching and binding introduction type waveguide (30) or microwave cavity resonator. Microwaves are transmitted into the plasma generating chamber (10) from a plurality of openings (34) which are formed in such side faces in the waveguide (30) or the microwave cavity resonator as correspond to in-phase microwave portions. Moreover, an ECR plasma device comprises the aforementioned ECR plasma source and a sample moving mechanism for moving a large-sized sample.
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申请公布号 |
US7485204(B2) |
申请公布日期 |
2009.02.03 |
申请号 |
US20040510479 |
申请日期 |
2004.10.07 |
申请人 |
MES AFTY CORPORATION |
发明人 |
MATSUO SEITARO;NOZAKI TOSHIYUKI;TANAKA FUMIO |
分类号 |
C23C16/00;C23F1/00;H01J37/32;H01L21/306;H01L21/3065;H01L21/31;H05H1/18;H05H1/46 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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