发明名称 Photosensitive composition and method for forming pattern using same
摘要 The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiation wherein m represents an integer of 0 or more.
申请公布号 US7485413(B2) 申请公布日期 2009.02.03
申请号 US20070751762 申请日期 2007.05.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAITO SATOSHI
分类号 G03F7/039;G03F7/30;C08G16/04;G03F7/032;H01L21/027 主分类号 G03F7/039
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