发明名称 |
Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems |
摘要 |
Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within a catch cup. A robotic dispense arm and gripper assembly may be positioned within the coating module for gripping and positioning a fluid syringe. An array of syringes may be stored on a solution tray within the wafer track coating module for holding a plurality of fluid syringes containing photoresist solutions.
|
申请公布号 |
US7485346(B2) |
申请公布日期 |
2009.02.03 |
申请号 |
US20060343368 |
申请日期 |
2006.01.30 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEM BRANKO;BABIKLAN DIKRAN |
分类号 |
B05D5/00;B05C5/00;B05C5/02;H01L21/00 |
主分类号 |
B05D5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|