发明名称 Method of manufacturing thick dielectric pattern and method of manufacturing image displaying apparatus
摘要 A method of manufacturing a thick dielectric pattern disposed on a substrate. A first precursor layer is formed by imparting a first photosensitive dielectric paste, including a dielectric material, onto a substrate and drying it. A second precursor layer is formed by imparting a second photosensitive dielectric paste, including a dielectric material higher in softening point than the dielectric material included in the first photosensitive dielectric paste, on the first precursor layer and drying it. Precursor patterns are formed by collectively exposing and developing the layered products of the first precursor layer and the second precursor layer through the mask of a predetermined pattern, and a thick dielectric pattern is formed by collectively baking the precursor patterns.
申请公布号 US7485410(B2) 申请公布日期 2009.02.03
申请号 US20050166105 申请日期 2005.06.27
申请人 CANON KABUSHIKI KAISHA 发明人 SUZUKI MASAAKI;WATANABE OSAMU
分类号 G03F7/26 主分类号 G03F7/26
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