| 摘要 |
<p>An imaging characteristics fluctuation predicting method, exposure apparatus, and device manufacturing method are provided to efficiently predict the imaging change character according to the exposure condition by calculating the correction factor for compensating for the change of the imaging characteristic. In the first exposure condition, the exposure light is illuminated in the projection optical system. The first imaging characteristic change of the projection optical system is measured. After the illumination is stopped, the exposure light is irradiated in the projection optical system under the second exposure condition before the imaging characteristic value comes back to the initial value in the beginning of investigation time. The second imaging characteristic change of the projection optical system is measured. The approximate formula of the first and the measured second imaging characteristic change is calculated based on the imaging characteristic model.</p> |
