CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

A chemically amplified positive photoresist composition, and a method for forming a resist pattern by using the composition are provided to improve resolution and coating property. A chemically amplified positive photoresist composition comprises a resin mixture comprising the repeating units represented by the formula 1 and the formula 2; a photoacid generator; and an organic solvent, wherein R1 and R2 are independently H, a C1-C10 linear or branched alkyl group or a C3-C10 cycloalkyl group; R3 is a C1-C10 linear or branched alkyl group or a C3-C10 cycloalkyl group; a1, a2, b and c are independently a number of 0-1; a1+a2+b+c=1; 0.30<=[(b+c)/(a1+a2+b+c)]<=0.34; and 0.01<=[c/(a1+a2+b+c)]<=0.2.